As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting bridge dimensions of the order 80 nm have been produced. These SQUIDs have a range of potential applications. As an illustration, we describe a method for characterizing the effective area and the magnetic penetration depth of a structured superconducting thin film in the extreme limit, where the superconducting penetration depth A is much greater than the film thickness and is comparable with the lateral dimensions of the device
['L. Hao', 'J.C. Macfarlane', 'J.C. Gallop', 'D. C. Cox', 'Patrick Joseph-Franks', 'David Hutson', 'Jiann-Jong Chen', 'S. K. H. Lam']
Confirmation of the INRiM and PTB Determinations of the Si Lattice Parameter