The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Nanoimprint lithography (NIL) techniques for fabricating micro- and nano-features are discussed including hot embossing lithography (HEL), UV Molding (UVM) and micro contact printing (μCP). Recent results in micro and nanopattern transfer are presented where features ranged from <100 nm to several centimeters. We also present a comparative study between standard glass microfluidic chips and their HEL counterparts by metrology. Hot-embossed microfluidic chips are shown to be faithful replicates of their parent stamps. NIL is presented as a promising avenue for low-cost, high throughput micro and nano-device fabrication.
['H. Luesebrink', 'Thomas Glinsner', 'Stephen C. Jakeway', 'H. John Crabtree', 'Neil S. Cameron', 'Hélène Roberge', 'Teodor Veres']
Transition of MEMS technology to nanofabrication.