Focused ion beam is a tool that allows to perform microsurgery of the interconnect network of an integrated circuit in order to change its functionality, without need of a metal tweak. This paper reports on the application of this technique to complex CMOS integrated circuits. Two case studies, conducted in Brazil, are presented. Electrical results show the focused ion beam circuit prototyping were successful. To our knowledge, this is the first time such result is reported in Latin America.
['E. Petitprez', 'D. M. Colombo', 'Felipe M. Henes', 'Laurent Courcelle', 'R. Tararam', 'S. Jacobsen', 'R. Soares', 'C. Krug', 'Marcelo Lubaszewski']
Successful prototyping of complex integrated circuits with focused ion beam