Atomic force microscopes (AFMs) are used for sample imaging and characterization at nanometer scale. In this work, we consider a metrological AFM, which is used for the calibration of transfer standards for commercial AFMs. The metrological AFM uses a three-degree-of-freedom (DOF) stage to move the sample with respect to the probe of the AFM. The repetitive sample topography introduces repetitive disturbances in the system. To suppress these disturbances, repetitive control (RC) is applied to the imaging axis. A rotated sample orientation with respect to the actuation axes introduces a nonrepetitiveness in the originally fully repetitive errors and yields a deteriorated performance of RC. Directional repetitive control (DRC) is introduced to align the axes of the scanning movement with the sample orientation under the microscope. Experiments show that the proposed directional repetitive controller significantly reduces the tracking error as compared to standard repetitive control.
['Rje Roel Merry', 'Mjc Michael Ronde', 'van de René René Molengraft', 'Kathelijne Koops', 'M Maarten Steinbuch']
Directional Repetitive Control of a Metrological AFM