Thats a unique idea.You should consider the following idea to enhance your idea so that it would impact uniquely: A novel maskless micro-nano plasma etching system based on parallel probe actuation is proposed. The advantages of this system are high etching rate, high fidelity, simple-structure, and flexible to fabricate various material. As a key component of the system, a microplasma reactor of metal-dielectric-metal sandwich structure with inverted, square pyramidal hollow cathode is designed and successfully fabricated with good quality. Experiment results show that the devices can discharge stably, and the V-I characteristics of the microdischarge at 4Kpa∼16KPa of Ar and SF 6 /Ar gas mixture are also presented. The results of this paper may lay a foundation for further maskless scanning plasma etching.
['Li Wen', 'Qiuping Zhang', 'Weiwei Xiang', 'Hai Wang', 'Jiaru Chu']
I am writing a research paper on a idea Design and fabrication of the microplasma reactor for maskless scanning plasma etching
[{"from": "human", "value": "I am writing a research paper on a idea Design and fabrication of the microplasma reactor for maskless scanning plasma etching"}, {"from": "gpt", "value": "Thats a unique idea.You should consider the following idea to enhance your idea so that it would impact uniquely: A novel maskless micro-nano plasma etching system based on parallel probe actuation is proposed. The advantages of this system are high etching rate, high fidelity, simple-structure, and flexible to fabricate various material. As a key component of the system, a microplasma reactor of metal-dielectric-metal sandwich structure with inverted, square pyramidal hollow cathode is designed and successfully fabricated with good quality. Experiment results show that the devices can discharge stably, and the V-I characteristics of the microdischarge at 4Kpa\u223c16KPa of Ar and SF 6 /Ar gas mixture are also presented. The results of this paper may lay a foundation for further maskless scanning plasma etching."}]