Depth Distribution of Residual Fluorine in Polyvinylidene Fluoride Film under Electron Bombardment
The influence of the electron initial energy on the kinetics of defluorination of polyvinylidene fluoride film (PVDF) surface under electron bombardment has been studied. The kinetic equation of the third order describes this process well for any electron energy. The minimum possible fluorine content in the near-surface layer of PVDF film exposed to long-term bombardment has been determined. Depth of penetration of electrons into the sample, i.e. the free path of bombarding electrons with different initial energies, has been calculated. Non-monotonic depth distribution of residual fluorine in the film, essentially depending on the electron energy, has been revealed.