ONE-DIMENSIONAL NONSTATIONARY PROBLEMS OF THE THERMAL RADIATION IN THE HALF SPACE
In this paper, we study the diffusion processes of dissolution of a very thin film in the adjacent relatively thick films, as well as diffusion in a massive substrate when a thin film is deposited on it. The considered mathematical models of diffusion processes take into account the flatness of the medium, the dependence of the diffusion coefficients on the concentration and limited solubility.