OPTICAL ACTINOMETRICAL METHOD OF CONTROL THE PLASMA CHEMICAL ETCHING FOR MICROELECTRONIC TECHNOLOGY
The aim of the research is to increase the accuracy of control of plasma chemical process. For example, the plasma chemical etching of structures р-Si/SiO2/Si analyzed the possibilities and prospects of optical actinometrical plasma chemical etching method of control in the manufacture of devices of modern micro- and nanoelectronics. The experimental results digestion microstructures. It is shown that the application of the process monitoring of plasma etching phase detection signal can significantly reduce the noise component and makes it practical to use optical actinometrical method to control the digestive process of small planes.