Study of impact of dielectric barrier discharge on the silicon-containing film
In this paper the microstructure and elemental composition of the applied onto the textolite surface film are investigated in the neighborhood of its electrical breakdown. Aim of the study is connected with necessity of developing of new dielectric materials which capable to resist in the discharge cell of dielectric barrier discharge in air at atmospheric pressure to the destructive impact of the electric field, micro-discharges, as well as ozone, which is a very active element.