KINETICS OF STRUCTURING SUB-MONOLAYER CARBON COATINGS ON SILICON CRYSTALS (100) UNDER MICROWAVE VACUUM PLASMA DEPOSITION
The methods of scanning atomic force microscopy and electron microscopy were first applied to detect the kinetic effect and the self-organization process for nanoscale domains under the deposition of sub-monolayer carbon coatings on the silicon (100) in the microwave plasma ethanol vapor of low pressure. The impact of the kinetic energy in carbon-containing ions on the kinetics of carbon cluster structures over atomically clean surface of silicon crystals (100). It is shown that nano-sized carbon-containing domains can serve as masked coatings in fabrication of spatial low-dimensional systems on the single-crystal silicon (100) based on highly anisotropic plasma chemical etching.