ANODIC BEHAVIOR OF IRON MONOSILICIDE IN SULFURIC ACID SOLUTIONS
The anodic behavior of FeSi electrode in 0,5 M H2SO4 and 0,05 H2SO4 + 0,45 M Na2SO4 in the range of potentials from -0,1 up to 2,0 V (in the scale of standard hydrogen electrode) has been investigated. It has been concluded that during the anodic oxidation process on the surface of the iron silicide the oxide film is formed that is similar in composition to SiO2. On the basis of impedance data the thickness of the oxide layer depending on the electrode potential and electrolyte composition has been calculated.