5873
By exploiting the unique chemistry involved for the fabrication of vertical arrays of SiNWs in metal - assisted chemical etching ( MaCE ) based either on HF / AgNO3 or HF / H2O2 chemistries , wet etching with alkali hydroxides such as NaOH or KOH preferentially attacks the bottom part of the vertical SiNWs .
 Chemical: HF; Chemical: AgNO3; Chemical: HF; Chemical: H2O2; Chemical: alkali hydroxides; Chemical: NaOH; Chemical: KOH
Please list all entity words in the text that fit the category.Output format is "type1: word1; type2: word2". 
Option: Chemical 
Text: {0} 
Answer:
 Chemical: HF; Chemical: AgNO3; Chemical: HF; Chemical: H2O2; Chemical: alkali hydroxides; Chemical: NaOH; Chemical: KOH