7193
Two - photon polymerization technology has been used to fabricate submicrometer three - dimensional ( 3D ) structures using a new polyfunctional perfluoropolyether - based resist , which is a polymer intrinsically hydrophobic and chemically resistant .
 Chemical: perfluoropolyether
Please list all entity words in the text that fit the category.Output format is "type1: word1; type2: word2". 
Option: Chemical 
Text: {0} 
Answer:
 Chemical: perfluoropolyether