6355
Chemical resistance in trifluoroacetic acid and 8 common organic solvents , including CH2Cl2 and toluene , were also investigated and no signs of degradation or weight changes were observed from parts submerged for 1 week in each solvent .
 Chemical resistance, degradation, weight
Please list all entity words in the text that fit the category. Output format is "word1, word2". 
Option: manufacturing standard, machanical property, manufacturing process, material, engineering feature, process parameter, machine or equipment, application, process characterization, enabling technology, biomedical, concept or principle 
Text: {0} 
Answer:
 Chemical resistance, degradation, weight