CVD techniques could provide better performance .
CVD techniques enable the production of thin films with superior quality compared to those obtained by sputtering , especially in terms of conformality , coverage , and stoichiometry control , and allows implementation of phase - change films in nanoelectronic devices .
CVD techniques could provide better performance and enable the production of thin films with superior quality compared to those obtained by sputtering , especially in terms of conformality , coverage , and stoichiometry control , and allows implementation of phase - change films in nanoelectronic devices .