These applications pose specific challenges for POU UPW filtration .
Point of use applications ( POU ) for UPW filtration include wet etch and clean , rinse prior to IPA vapor or liquid dry , as well as lithography dispense UPW rinse following develop .
These applications pose specific challenges for UPW   filtration .
Point of use applications ( POU ) for UPW filtration include wet etch and clean , rinse prior to IPA vapor or liquid dry , as well as lithography dispense UPW rinse following develop .