the x - ray device shown in fig1 includes an x - ray source 1 which emits a radiation beam 2 during an x - ray exposure . the cross - section of this beam can be varied by means of a controllable multi - leaf collimator 3 . the radiation beam 2 is incident on an image receiver 4 after having traversed an object 5 to be examined which is situated on the top 6 of an examination table the remainder of which is not shown . between the image receiver 4 and the table top 6 there is provided a sensor 4 a of the automatic exposure device which measures the dose behind the object 5 to be examined . even though the invention can also be used in conjunction with an image receiver in the form of a conventional film - foil combination , it will be assumed hereinafter that the image receiver 4 is a so - called digital image detector , that is , a detector which can be electrically read out and delivers image signals which are dependent on the radiation dose at the various points ( pixels ) of the detector . an x - ray image is reconstructed from these image signals in an image processing unit 7 so as to be displayed on a monitor 8 . the x - ray source 1 receives its power supply from an x - ray generator 9 . the components 1 to 9 are controlled by a control unit 10 , for example , a workstation , which can be accessed by the operator via an input unit 11 . the data input by the user or fetched by the entry made by the user can be displayed on the monitor 8 or on a separate display . the user can either freely adjust the exposure parameters required for forming an x - ray image or fetch a set of exposure parameters in the case of apr exposures , and the control unit 10 then automatically adjusts the components 1 to 9 accordingly . to this end , the control unit 10 accesses a first storage arrangement 101 in which a number of first sets of exposure parameters s 11 . . . s 1i . . . s 1m is stored . therein , m is the number of first sets of exposure parameters which may amount to more than 1000 . each set of exposure parameters comprises a number l of exposure parameters . part of said exposure parameters has been adjusted already before the beginning of an x - ray exposure , for example , the size of the exposure field to be irradiated , or becomes active only during an x - ray exposure , for example , the voltage applied to the x - ray source , or occur only at the end of the exposure , for example , the exposure duration or the dose on the image receiver which can be determined only after the x - ray exposure . many parameters can be directly adjusted in the form in which they are preset , for example , the voltage applied to the x - ray source ( disregarding , of course , adjusting errors ). other parameters , such as the dose on the image receiver 4 or the exposure index which is the inverse thereof , cannot be directly adjusted but are influenced by other exposure parameters such as , for example , the mas product . the operation of the x - ray device in the exposure mode in which x - ray images are formed will be described in detail hereinafter with reference to the flow chart of fig2 . after the initialization in the step 20 , the operator fetches a first set of exposure parameters s 1 i via the input unit 11 , i being between 1 and m . the exposure parameters belonging to this set are displayed to the user , for example , on the monitor 8 and can be modified by the user in the step 22 by means of the input unit 11 . in the step 23 an x - ray image is formed while using these preset , possibly modified exposure parameters which have been adjusted via suitable adjusting members in the x - ray device . in the step 24 the exposure parameters which were active during the exposure are stored . these are exposure parameters which were already contained in the set of parameters fetched , but they may also be modified exposure parameters . some exposure parameters , for example , the exposure index or the dose on the image receiver , can be determined only after completion of an x - ray exposure ( in that integration is performed over the image signals supplied by the image receiver in order to form a mean value ). the exposure parameters active during the x - ray exposure constitute a second set of exposure parameters s 2ij , the index i of this second set of exposure parameters being linked to the first set of exposure parameters s 1i and the index j having a value which is dependent on the number of times the first set of exposure parameters s 1i has been fetched . this second set of exposure parameters is stored in a second storage arrangement 102 which is capable of storing n sets of exposure parameters for each first set of exposure parameters , so that the sets of exposure parameters s 2i1 . . . s 2i . . . s 2jn are obtained in this memory for the first set of exposure parameters s 1i . the exposure mode for the relevant x - ray exposure is then terminated ( step 25 ). comparison of the sets of exposure parameters stored in the two storage arrangements 101 and 102 takes place either at freely selectable instants or automatically after a predetermined number of x - ray exposures or after a given period of time has elapsed . the x - ray device then operates in an adaptation mode whose flow chart is shown in fig3 . to this end , in the step 31 the sets of exposure parameters s 2i1 . . . s 2in are fetched which were active during the apr x - ray exposures for which the set of exposure parameters s 1i was fetched from the first storage arrangement . for each exposure parameter p k of the first set of exposure parameters , for example , the mas product , the values p k1 . . . p kn active during the n x - ray exposures are analyzed in the step 32 and compared with the parameter p k contained in the first set of exposure parameters , for example , by forming its arithmetical mean value or median value . the specific evaluation of the exposure parameters may be dependent on the nature of the exposure parameters . whereas for continuously variable exposure parameters , such as the mas product or the dimensions of an exposure field , it may be useful to derive an arithmetical mean value or median value from the exposure parameters active during the x - ray exposure , for other exposure parameters ( for example , the presence or absence of a scatter grid in the beam path ) it may be useful to base the further presets on which of the two possibilities ( with scatter grid or without scatter grid ) was chosen more frequently during the n exposures . before basing the exposure parameters of the set of exposure parameters s 1i on the exposure parameter p k thus determined from the preceding x - ray exposures , it makes sense to perform further tests in the step 33 . in order to avoid incidental or too frequent modifications of the exposure parameters , thresholds may be introduced for the adaptation so that an exposure parameter stored thus far in the first storage arrangement is preserved when it has been modified only comparatively rarely . however , if it has been modified comparatively frequently and in the same sense , for example , if the exposure field was enlarged in more than 50 percent of all cases , the relevant exposure parameter is modified accordingly . furthermore , it may be useful to limit the range of values for the exposure parameters in such a manner that the settings which do not make sense are precluded . thus , a corresponding value can be assigned to the relevant parameter p k in the step 33 . this is repeated for all exposure parameters p 1 . . . p k . . . p l of a set , so that a new set s 1i of ( at least partly modified ) exposure parameters is obtained which is stored in the first storage arrangement 101 ( step 34 ) instead of the set used thus far . the steps 31 . . . 34 can be repeated for other sets of exposure parameters , after which the adaptation mode is terminated ( step 35 ). the adaptation mode , however , can also be automatically activated when an activation criterion is satisfied for an individual set of exposure parameters , for example , when since the last adaptation a given number of x - ray exposures has been carried out while using this fetched set . as has already been described , for given types of exposure ( without automatic exposure device ) an mas product and a given exposure index or a given dose on the image receiver are specified as exposure parameters . these exposure parameters are dependent on one another . in this case in the steps 31 . . . 34 no new value of this exposure parameter is determined from the values of the exposure index or the dose on the image receiver after the exposures , but these values are used to determine a more suitable value of the mas product . for example , when the evaluation in the step 32 or 33 reveals that on average the receiver dose was factor of 2 too high during the preceding n exposures ( or the exposure index was a factor of 2 too low ), the mas product adjusted for the exposures is reduced by the factor 2 and preset as the new exposure parameter . furthermore , there are also exposures which involve an automatic exposure device where the exposure index is subject to a given a sensitivity level of the automatic exposure device for which it is expected that the detector dose typically reaches a given value which is associated with a given sensitivity class ( for the specification of the sensitivity classes there are medical standards such as the guidelines for physicians ). this sensitivity class can be adapted in the same way as the mas value . if the evaluation in the step 32 or 33 reveals , for example , that the receiver dose was on average a factor of 2 too high during the preceding n exposures ( or the exposure index was a factor of 2 too low ), the sensitivity level adjusted for the exposures is lowered by 3 levels ( corresponding to a factor of 2 ) and preset as the new exposure parameter . it is not necessary to use separate storage arrangements 101 and 102 for storing the first and second sets of exposure parameters . the exposure parameters can be stored in the same memory . the second sets of exposure parameters resulting from the x - ray exposures need not be stored in a given memory location , but can be stored successively ; in that case additionally an identification is stored for the fetched first set of exposure parameters . the invention is of course not limited to the described or shown embodiments , but generally extends to any embodiment , which falls within the scope of the appended claims as seen in light of the foregoing description and drawings . while a particular feature of the invention may have been described above with respect to only one of the illustrated embodiments , such features may be combined with one or more other features of other embodiments , as may be desired and advantageous for any given particular application . from the above description of the invention , those skilled in the art will perceive improvements , changes and modification . such improvements , changes and modification within the skill of the art are intended to be covered by the appended claims .
the invention relates to an x - ray device in which a set of exposure parameters is fetched from among a number of such sets stored in a first storage arrangement for apr x - ray exposures . the exposure parameters which result therefrom during the subsequent x - ray exposure and have possibly been modified by the user are stored in a second storage arrangement . the x - ray device includes means for evaluating the second sets of exposure parameters which are associated with the same first set of exposure parameters and for deriving therefrom a new set of exposure parameters which is stored in the first storage arrangement instead of the first set of exposure parameters and forms the basis for apr x - ray exposures from then on .