the entire content of u . s . patent application ser . no . 12 / 136 , 683 , filed jun . 10 , 2008 , is hereby incorporated by reference . high voltage rf electrical energy is applied to an electrosurgical probe for tissue coagulation and cutting . it is understood that the electrosurgery probe itself may be of the types disclosed here or in the above described patent applications or other types as known in the field . typically the probe has a relatively small surface area at its active electrode portion ( tip ) to minimize heating of the tissue being treated . the probe may be uninsulated ( bare metal ) or partly covered with a high dielectric insulating layer . the probe may be mono or bi - polar . in some applications the probe is immersed in the tissue being operated on , which has naturally occurring fluid present or some type of liquid is provided immediately around the probe in the surgical field . in other uses for , e . g ., fulguration no liquid is present . energy is intended primarily for use with electrosurgical coagulation , but can be used for simultaneous tissue cutting and coagulation . for tissue coagulation purposes some amount of charring is in fact desirable since that is the intent of coagulation ( to seal tissue ). however , tissue charring is undesirable beyond the immediate area being coagulated . the goal is to maintain a relatively low probe temperature and hence minimize heat transfer to the surrounding tissue while still accomplishing coagulation or desiccation or fulguration . hence the present method is directed to what is sometimes called “ cold coagulation .” the edge of the probe is intended for both cutting and coagulation , and the flat ( side ) portion thereof with “ dimples ” ( the openings ) serves for coagulation only . as the probe edge cuts through the tissue , the flat portion of the probe sends an electrical arc to the walls of the wound to heat and close the blood vessels . the dimples help the electrical arc to reach all blood vessels , as in an uninsulated probe , but the small diameter of the dimples advantageously provides a short thermal relaxation time and , as a result , low temperature during pulsed coagulation . this is accomplished here by applying high power rf groups of bursts with relatively long off times and thus relatively low duty cycles compared to conventional electrosurgical coagulation . while equipment limitations may prevent use of rf power levels above 300 w given current materials and electrical components , ultimately this is not limiting . hence generally , the present invention is directed to use of high rated power rf ( above 300 w ) during the pulse on time . since power depends on the load , the rated load is by definition the load where the maximum ( rated ) power can be achieved . a typical voltage here ( both positive and negative ) is up to 12 , 000 volts peak to peak under open circuit conditions . a typical waveform for this condition is a damped sine wave . in one embodiment the rf power has a carrier frequency of approximately 460 khz , so the duration of each period ( pulse ) is approximately 2 . 2 microseconds . the on time rf pulses can be sine waves , but usually a sine wave is good only for pure cutting . for blended cut and coagulation purposes , periods of pulses are clustered in each burst with no rf energy between them . in one embodiment , there is only one period per burst but this is not limiting ; there may be 2 , 3 , or more pulses per burst as shown respectively in fig1 a , 1 b , 1 c for different types of coagulation . the repetition rate for the bursts is e . g . 30 khz . a typical frequency for the groups of burst is 25 hz . a group of these bursts defines the on time , followed by the off time . hence the duty cycle of each group ( during on time ) is in the range of 1 % to 50 %. that is , only 1 % to 50 % of the total time during each group of bursts is actually occupied by rf energy and the remainder is of zero voltage applied to the load , as shown in fig1 a , 1 b , 1 c . a number of such pulse bursts may also be grouped together . typically the off time between each group of bursts is about 1 millisecond or more to allow further cooling of the probe and associated tissue . the on time can be from 100 microseconds to 10 ms , followed by the off time off interval , at least 1 ms in duration . this modulation further reduces the duty cycle by a factor of 0 . 01 to 0 . 9 . the open circuit waveform is , e . g ., a damped sine wave at the carrier frequency ( such as 460 khz in fig1 c ) which shrinks to a sine wave cycle as shown in fig1 a at a low impedance load . the amplitude ( voltage ) of these pulses decreases with the resistance of the load in such a way that the average rf power achieves a maximum at a so called “ rated load ”, typically 100 to 1000 ohm . the time t between pulse centers corresponds to the inverse of the carrier frequency ( for example t = 1 / 460 khz ). the number of pulses in a pulse burst determines the rated load , roll - off points on the load curve , the type of the surgical mode ( called in the field , for instance , blend , desiccation , fulguration ), and the length of the spark . the repetition rate of the pulse bursts is typically 20 to 60 khz ( indicated as burst of 30 khz in fig1 b ). the purpose of these bursts is not a cooling of the tissue during the burst off time , since tissue temperature cannot decrease during mere tens of microseconds . instead the off time allows for collapse of undesirable vapor bubbles formed on or near the probe , arising during the pulse on time . otherwise due to the vapor bubbles the tissue experiences problematic “ micro explosions ” of the bubbles , repulsing tissue from the probe , and precluding effective coagulation . in the present method therefore for coagulation the pulse bursts are grouped together , with a time interval between them ( determined by the burst duty cycle ) longer than the thermal relaxation time for a particular probe . the thermal relaxation time t can be assessed as t = r 2 cρ / π 2 k = r 2 0 . 7 μs / μm 2 , where r is the characteristic size of the electrode in μm , c is heat capacity , ρ is density , and k is thermal conductivity of liquid as plotted in fig2 . for instance , for a 10 μm effective probe electrode size the thermal relaxation time is 701 μs , but for 1 mm probe this value is 0 . 7 seconds . so , a small probe electrode is generally required here . the small probe can coagulate only a small area adjacent to the probe electrode . with a spark ( arc ) length of 1 mm and a point electrode that is 0 . 1 mm in diameter , one can coagulate a spot of tissue 2 . 1 mm in diameter . multiple small electrodes , representing small openings in the probe insulation are introduced on the flat portion of the blade and spaced apart to coagulate a large solid area of tissue . the spark circles should overlap to cover the whole tissue surface . the size of the individual electrodes ( the openings ) is small enough to provide fast cooling . at pulsed mode as described above , low average tissue temperature can be achieved . as a result , the probe provides shallow strong coagulation with a safe temperature of the probe . fig3 shows a partial view of a side surface of the associated probe 30 in which the overlying insulating layer 34 defines a pattern of openings ( dimples ) 36 a , 36 b , 36 c , etc . to expose the underlying metal 40 of the electrode of probe 30 . in this case the size of each opening is shown as about 0 . 05 mm by 0 . 05 mm ( each being approximately a square ), however , this size and shape are not limiting . the spacing between openings ( center to center ) is in the range of 0 . 2 to 1 . 0 mm , not limiting . also conventionally the metal edge 42 of probe 30 is also exposed through the overlying insulating layer 34 . the actual materials of the probe metal 40 and insulation 34 are conventional as explained in the above referenced patents and as well known in the field . typically the associated equipment ( rf generator ) has variable outputs and can be adjusted by the operator to provide pulses of various frequencies and timing durations so that the present pulse regime is thereby accomplished . this pulse regime may depend on probe size , the nature of the surgical procedure being undertaken such as fulguration , desiccation , coagulation , and other factors as determined by the operator ( surgeon ). a typical range of correct frequencies for the pulses is 100 khz to 5 mhz , of which the above described 460 khz is merely illustrative . in accordance with this approach , the probe and the associated tissue may be kept below or above 100 ° c ., depending on what is required for the particular surgical procedure being undertaken . advantageously the relatively low temperature of the probe - tissue interface results in reduced adhesion of the charred tissue to the probe , decreasing smoke and providing better performance for coagulation . an rf generator 50 for e . g . pulsed cutting of tissue ( see circuit diagram fig4 a ), is compatible with a pulsed coagulation method and probe described above . such an rf generator is believed to be novel for electrosurgery , where out coupling typically represents a transformer , although generally rf generators are well known in the electronics field for generating high frequency electrical signals . such rf generators typically are half bridge inverters . the present rf generator has only capacitors in series with the load as required by regulatory rules ( for a capacitance & lt ; 5 nf ), and the usual rf transformer is omitted . associated waveforms are described in palanker u . s . pat . no . 7 , 238 , 185 , incorporated herein by reference in its entirety , and represent a true bipolar square wave . the present rf generator for tissue cutting may be a part of a system producing also coagulation waveforms according to fig1 a , 1 b , 1 c to combine cutting and coagulation ability for a single probe . in accordance with similar circuits , the present rf generator apparatus or circuit 50 conventionally includes a half bridge inverter with high power field effect transistors ( fet ) q 2 , q 1 used as respective low and high side switches . in such an rf switching generator or power supply the amount of time for each switch ( transistors q 1 , q 2 ) to turn on or off is important . for proper performance the switching transistors should be capable of switching in less than approximately 10 % of the period of the output pulse . for a 4 mhz frequency pulse this requires that each transistor &# 39 ; s q 1 , q 2 gate terminal be charged / discharged in less than 25 nanoseconds . as well known in the field , the effective gate capacitance or input capacitance of such field effect transistors q 1 , q 2 includes the gate - source capacitance and the gate - drain capacitance , also referred to as miller capacitance . the total gate charge required to charge the gate of a typical field effect transistor from 0v to 3v ( enough to switch the transistor ) is 80 nc . this total charge includes the miller charge required to discharge the gate - drain capacitance when the transistor switches from the off state with a drain - source voltage of 450v , to the on state . if the entire charge is to be delivered in a 25 nanosecond period as indicated above , then the gate driver circuit which provides the signal to the gate must apply an average current of 80 nc / 25 ns = 3 . 2 amps with a peak current as high as 12 amps . to meet this , the gate driver circuits 52 , 54 in this generator are selected to provide a 20 amp maximum current , but this is merely illustrative . for typical electrosurgery applications , the electrical charge injected in the tissue from the probe must be close to zero to minimize undesirable muscle stimulation . thus it is important to have balanced positive and negative portions of the pulsed current provided to the probe . in the present rf generator therefore two channels 58 , 60 are used , e . g ., connected to two direct current ( dc ) power supplies ( not shown ), one providing + 500v and the second providing − 500v output signals at respectively nodes 115 , 117 . the output terminal 112 ( to the probe ) for generator 50 therefore is connected at a midpoint node 66 between the two channels 58 , 60 . voltage at this terminal 66 therefore swings between positive and negative voltages as described further below . the current driving for the gate of each switching transistor q 1 , q 2 is provided here with a radio frequency isolated independent driving direct current power supply . the rf isolation is required because the gate of each transistor q 1 , q 2 is referenced to the source of the transistor , which switches with slew rates of more than 30 volt / nanosecond . the high side driving reference point 66 has to have a minimum coupling capacitance and leakage inductance to the ground of the drivers 52 , 54 . transformers 78 , 80 are provided as is conventional in each channel 58 , 60 for galvanic isolation and level shifting required for each switching transistor q 1 , q 2 . an advantage of this is at the high - side gate driver circuit 52 does not require a floating power supply since the power to transistor q 1 is coupled through the transformer 78 . the leakage inductance of the windings of each transformer 78 , 80 makes it difficult to obtain the rapid rise of the current required and causes excessive ringing which must be suppressed . improved operation is obtained here by using a large sinusoidal drive current since the leakage inductance of the transformers 78 , 80 along with the input capacitance of each transistor q 1 , q 2 can be included in a resonant circuit . in this case the sine wave output of the resonant circuit has higher amplitude than the transistor switching threshold voltage , to minimize switching time . however , fast switching results in shorter high voltage swings on the source / drain terminals of the switching transistors q 1 , q 2 . short intense transients therefore travel back from the mid - point 66 of the half bridge to the gate terminals of transistors q 1 , q 2 due to the miller capacitance into the output of each gate driver circuit 52 , 54 from each of the transformers 78 , 80 . each gate driver circuit 52 , 54 has a 0 . 6 ohm output resistance in both high and low output voltage regimes . therefore the energy of the transient goes mostly to the low voltage ground as indicated in fig5 a and causes ringing . this undesirable ringing may affect the input of the gate driver circuits 52 , 54 causing simultaneously opening and closure of the switching transistors q 1 , q 2 which , of course , must be avoided . in order to increase signal to noise discrimination level and avoid ringing , a negative bias voltage as shown of − 1v is applied to the input (“ in ”) terminal of each gate driver circuit 52 , 54 . additionally in this case the same input terminal of each gate driver circuit 52 , 54 is also coupled to ground via a low resistance ( 22 ohm ) resistor 80 , 82 . also , 22 ohm resistors 86 , 88 are coupled across the primary and / or secondary windings of each transformer 78 , 80 to damp ringing . also , to decrease quality factor of the resonant circuit , inductances of the primary and secondary windings of each transformer 78 , 80 are chosen to be minimal e . g . 1 . 6 microh . with the input capacitance of the mosfet q 1 , q 2 ( 1 nf ) resonant frequency of the contour f = 1 /( 2π ( lc ) 0 . 5 )= 4 mhz is equal to the operation frequency . the inductance of the ground path to the input terminal of each gate driver circuit 52 , 54 is minimized with short and wide leads . also , a dc / dc converter 90 , 92 is coupled to the input terminal of each gate driver circuit 52 , 54 to create the above mentioned negative direct current bias of − 1 volt to that input terminal and effectively discriminate noise at the input terminal of each gate driver circuit 52 , 54 . as shown in fig4 a , effectively the negative input bias at the input terminal “ in ” of each gate driver circuit 52 , 54 is − 1 volt in this example . in the left hand portion of fig4 a are shown ( as waveforms ) the input control signals 100 , 102 applied to each input terminal 106 , 108 of the two channels of the rf generator and shown as a set of square waves which determines timing for the pulse bursts and pulses as explained above . the input control signals are generated conventionally . conventionally in the far right hand portion of fig4 a is the rf generator output terminal 112 labeled “ pulse out ” which is connected to the probe . fig4 b shows an output waveform ( at node 112 ) of the rf generator 50 . also provided is a high voltage ground terminal 116 connected to the probe ground terminal or to a return line connected to the patient . the remaining circuit elements in fig4 a are conventional ; in some cases component numbers or values are shown , but these are only exemplary . fig5 a shows via waveforms how the circuit of fig4 a would have an accumulation of noise on a low voltage ground resulting in an uncontrollable wave form , e . g ., due to ringing . the horizontal axis here refers to time and the vertical axis is the voltage at the input terminal of each gate driver . the horizontal broken line at 3 volt is the threshold voltage at the input terminal of the gate drivers 52 , 54 . fig4 b shows how the above described negative bias of − 1 volt applied to that same input terminal ( and also shown as the horizontal broken line in fig5 b ) reduces the amount of noise compared to fig4 a at the in terminal to the gate driver circuits 52 , 54 . in one embodiment , the circuit of fig4 a provides over current protection to prevent damage to the switching transistors and / or the other components . typically failure of such a rf generator is caused by excessive currents flowing either through the switching transistors or into the output terminal . various conventional protection circuits are known and an example is shown in fig6 which would be coupled conventionally to generator 50 . these protection circuits typically include current transformer sensors connected either to the return patient cable ( ground to the patient , e . g ., at node 116 ) or to the high voltage lines at node 112 . the circuit of fig4 a since it has two channels 58 , 60 would typically have two such protection circuits , one coupled to each channel 58 , 60 . this description is illustrative and not limiting . further modifications and improvements will be apparent to those skilled in the art in light of this disclosure and are intended to fall within the scope of the pending claims .
method and apparatus for electrosurgery including tissue coagulation using very high voltage pulses of electrical energy applied to the electrosurgical probe . this minimizes heating of the surrounding tissue in the probe and is especially suitable for precise and limited coagulation and fulguration without excessive tissue charring or other damage . the power at rated load of the applied pulses to the probe is typically over 300w and the duration of the on time is very short , so each group of pulse bursts is of relatively low duty cycle . an rf generator is also provided for delivering electrical energy to an electrosurgical probe with the proper characteristics , including fast switching times .