Elektronenmikroskopische Untersuchung von Transversalschnitten dünner Schichten auf festen Unterlagen
A method is described which allows to prepare transverse sections of thin films by means of an ion etching technique so that transmission electron micrographs of the film structure can be carried out. A section through a 6-layered optical film with a total thickness of 0.62 μm is shown as an example.