X-ray diffraction imaging of metal–oxide epitaxial tunnel junctions made by optical lithography: use of focused and unfocused X-ray beams
Metal-oxide tunnel junctions made by optical lithography were studied by X-ray diffraction (imaging approach with diffraction contrast) to access local distortions of the crystalline planes of the constituting layers. The effect of the size (10–150 µm) and shape (disc, square and rectangle) of the junction was investigated.