Characterization and optimization of mid-frequency plasma-enhanced chemical vapour deposited carbon films using response surface methodology
Abstract Thin carbon films have been deposited by decomposition of methane in a methane-argon plasma created by a pulsed mid-frequency (450 kHz) symmetrical discharge at relatively high pressures of 0.5–1 Torr. Different combinations of pressure, deposition temperature, gas composition and plasma power were used as process parameters. The films have subsequently been characterized with respect to properties that are of interest in the deposition of diamond-like carbon (DLC) films, such as wear resistance, optical band gap and film thickness. Response surface methodology has been employed to obtain a model for the dependence of these film properties on the deposition parameters and to find an optimum parameter region for depositing films with required properties.