Electrical properties of hydroxyapatite thin films grown by pulsed laser deposition
Abstract The formation of bioceramic hydroxyapatite (HAp) thin films has been accomplished on various substrates, such as Ti, α -Al 2 O 3 , SiO 2 //Si(100) and SrTiO 3 (100) using an ArF pulsed laser deposition. The surface morphology of the HAp films was also examined using an atomic force microscope. Au/HAp/Nb doped SrTiO 3 (100) structures have been fabricated to measure the electrical properties of the HAp films, and the dielectric constant and breakdown voltage at 25 °C are 5.7 (at 1 MHz) and 10 4 V cm −1 , respectively. From our results, it is suggested that the HAp films are useful not only as a biocompatible coating material for implantation but also for insulating and dielectric materials used in electric circuits and bio-electronic devices.