Charging method for preparing binary submicron metal alloy powder by using physical vapor deposition
The invention discloses a charging method for preparing binary submicron metal alloy powder by using a physical vapor deposition method. The charging method comprises the steps that saturated vapor pressure of each metal element in the metal alloy powder in a certain temperature range is calculated, a degree of metal evaporation is judged, and according to content of each element in the metal alloy powder and the Raoult's law, the charging speed ratio of each metal element is calculated; according to charging ratio of each metal element, pure metal which contains a large proportion in the metal alloy powder serves as a main metal element and is added into a crucible inside a metal evaporating device in advance, the charging speed of small proportional metal, namely a secondary metal element and the charging speed of the main metal element are adjusted, then charging is conducted, and the submicron-class binary powder is obtained. According to the method, the binary submicron metal alloy powder which is even in ingredients can be produced effectively and continuously.