Energy and mass spectroscopy studies during triode ion plating of TiN films in two different layouts
Abstract Plasma properties are compared in two triode ion-plating systems using a low-voltage arc discharge. The systems differ in the configuration of the chamber and magnetic field. Mass and energy distributions of positive ions during deposition of TiN films were measured by an energy-resolved mass spectrometer. Plasma parameters were determined also by Langmuir probe diagnostics. In both systems, single and multiple charged ions of Ar and N 2 gas and the evaporated Ti were detected. The system with a strong magnetic field confinement exhibits a higher plasma potential ( U p =55 V) under standard deposition conditions, the peak ion energy is higher and the energy distribution is narrower than in the system without magnetic confinement ( U p =12 to 35 V). The probability for the multiple charged ions in this system is much higher than in the system without the magnetic confinement, so the population of Ti ++ in this system is even higher than that of Ti + . The presence of high-energy neutral Ti is also observed.