Preparation and magnetic properties of Fe-AI-N thin films
The FeAIN thin films were deposited on Si(100) and NaCI substrates by dual ion beam sputtering. The effects of nitrogen pressure and substrate temperature on the structure and magnetic properties of FeAIN films were investigated. The FeAIN films with higher value of the saturation magnetization (Ms) agree with that films deposited at higher Ts or lower R(N2). It is found that the Al addition in FeN films results in the small crystallite, and the coercivity (Hc) decrease, and improvement of the thermal stability as well. After annealing at 500℃, the best soft magnetic properties of the Fe-AI-N films with 10% (atomic fraction) Al content are Ms of 2.02 T and Hc of 0.96 kA/m.