Random Lasing Emission of ZnO Nanorods from Different Seeding Thickness

We present the growth of ZnO nanorods (NRods) prepared by chemical bath deposition on 100 nm and 200 nm ZnO seed layer sputtered on glass substrate. The structural and optical properties of ZnO NRods were investigated by Field Emission Scanning Electron Microscope (FESEM), energy-dispersive X-ray (EDX), X-Ray Diffraction (XRD), and UV-Visible (UV-Vis) analyses. Random lasing (RL) emission behaviour was characterized by pulsed-wave micro-photoluminescence (pw µ-PL) analysis. Changed in seed layer thickness on 100 nm and 200 nm, allowing for greater particle size of ZnO NRods to form, while maintaining the preferred diffraction of self-organized growth direction with high-quality c-plane. The reduction in optical properties of ZnO NRods also lowering random lasing emission threshold toward higher excitation power density from 37.86 kW/cm2 to 95.40 kW/cm2.