Plasma-chemical deposition of diamond-like coatings in capacitively coupled RF plasma in toluene

Experimental study of the rates of plasma-chemical deposition of diamond-like coatings in toluene vapour in capacitive RF discharge was carried out. It is shown that in the RF power range of 100-300 W, the deposition rate is mainly affected by the toluene pressure in the vacuum chamber. The maximum deposition rate obtained was 4.15 μm/h.