Talbot self-imaging effect on the MHCG characterized by NSOM

In this paper, the design and preparation of polymer based monolithic high-contrast grating (MHCG) structures and their Talbot self-imaging effect are presented. For the preparation of MHCG structures to IP-Dip negative photoresist material, 3D laser lithography was used. The shape and morphological properties of the prepared MHCG structure were investigated by scanning electron microscope (SEM). Finally, the highly resolved near-field scanning optical microscope (NSOM) for the vertical optical field distribution over the grating structure was used. The demonstration of the Talbot effect for different wavelengths in a diffraction and a subwavelength regime is presented theoretically and experimentally from NSOM measurements.