High speed thin film thickness mapping by using dynamic spectroscopic imaging ellipsometry

We describe a dynamic spectroscopic imaging ellipsometer employing a monolithic polarizing interferometer. It measures a spatio-spectral ellipsometric phase data Δ(λ,x) dynamically with a measurement speed of around 30Hz which enables us to measure a highly precise spectroscopic ellipsometric mapping data Δ(λ,x,y) for 10mm x 10mm area in a few tens of seconds with a high spatial resolution of tens of microns. The proposed system can provide ultrafast spectroscopic ellipsometric inspection capability for various semiconductor manufacturing applications.