Non-linear etch process of MF particles embedded in an rf plasma with oxygen admixture

Commonly used melamine formaldehyde micro-particles exposed to an rf discharge are known to be etched by a plasma as soon as an admixture of oxygen is present. By means of in situ high precision size measurements, the plasma–surface interaction is investigated. A comparison of experimental data, advanced Mie-scattering techniques, and a reaction rate model allows, for the first time, to quantitatively describe the etch process.