Spray Deposited Ni Doped Co3O4 Thin Films for Electrochemical Applications

Nickel-doped Co3O4 films were prepared using fluorine doped tin oxide (FTO) substrates at various
nickel concentrations (x = 0.025, 0.05, 0.075 and 0.1) using a spray pyrolyzed process at 300 ºC.
Experimental techniques were used to characterize the materials by XRD, SEM, EDAX, UV-Vis,
FTIR spectroscopy, magnetic susceptibility and cyclic voltammetry. When nickel is present in any
concentration of Co3O4, the structural analysis using XRD confirms the spinel cubic structure of the
material. By using a scanning electron microscope, porous morphological studies are conducted. EDAX
examines the chemical composition of the prepared thin films. A 0.050 M concentrations demonstrated
the ideal structure, good morphological analysis and energy bandgap. Based on the results, the prepared
films were effectively used in the electrochemical performance.