Ultraviolet radiation is used for very fine resolution photolithography, a procedure wherein a chemical called a photoresist is exposed to UV radiation that has passed through a mask. The exposure causes chemical reactions to occur in the photoresist. After removal of unwanted photoresist, a pattern determined by the mask remains on the sample. Steps may then be taken to "etch" away, deposit on or otherwise modify areas of the sample where no photoresist remains.
Photolithography is used in the manufacture of semiconductors, integrated circuit components, and printed circuit boards. Photolithography processes used to fabricate electronic integrated circuits presently use 193 nm UV and are experimentally using 13.5 nm UV for extreme ultraviolet lithography.