The present invention relates to read only memory (ROM) cells. The present invention also relates to methods and systems for forming ROM cell-based devices. The present invention additionally relates to methods and systems for configuring ROM cell architectures. This invention additionally pertains to a type of mask ROM. More specifically, the present invention is related to a contact or via type of mask ROM, which permits shortening of the cycle time of the manufacturing process.
Read only memory (ROM) is so named because its cells can read data only from the memory cells. ROM is essentially a semiconductor circuit into which code or data can be permanently installed by a particular manufacturing process. ROM circuits are typically utilized to permanently store code in electronic equipment, such as computers, microprocessor systems, and so forth. The code or information stored in the ROM circuit is non-volatile when the power supply is powered off. There are various types of ROM devices, including Mask ROM, PROM (Programmable ROM), EPROM (Erasable Programmable ROM) and EEPROM (Electrically Erasable Programmable ROM). Such devices differ from one another in the type of methods utilized by the particular ROM to store data. Mask ROM is the most fundamental type of ROM.
For mask ROM, the memory data are loaded in the memory cells during manufacture. The data-writing step is called programming or coding. Usually, the interval from the time when the coding data in the mask ROM are obtained from the user to the time of shipment of the product is referred to as the cycle time, or turn-around-time. For ROM products, shortening the turn-around-time is an important task from the viewpoint of the commercial value of the products and productivity.
Depending on the data coding method, the mask ROMs can be classified into the diffusion type, contact type and via contact type. For each of these methods, there is a trade-off relationship between the cycle time and the degree of integration. When the actual ROM products are manufactured, it is necessary to select the appropriate method corresponding to the characteristics and demands on the specific type of products.
Memory cells are typically fabricated on a portion of a ROM device that includes an array of single transitory, typically a field effect transistor (FET), arranged in rows and columns. The arrays of FETs are built by first forming an array of closely spaced parallel electrically conducting line regions in the semiconductor substrate called xe2x80x9cbit linesxe2x80x9d. The bit lines serve as the source/drain regions of the FETs, and also serve as the electrical interconnections to the peripheral circuits for outputting the stored binary data. The buried bit lines are usually formed in the semiconductor substrate by ion implantation and a thermal oxide is then grown on the semiconductor substrate forming the gate oxide of the FET between the bit lines. The thermal oxide also provides the electrical insulation layer over the bit lines.
A plurality of closely spaced parallel conducting lines referred to as xe2x80x9cword linesxe2x80x9d, usually formed from a doped polysilicon layer, can then be formed on the semiconductor substrate having an orthogonal direction to the buried bit lines. The word lines serve as the gate electrode of the FETs and also function as the electrical interconnection to the peripheral address decode circuit. The array of ROM cells are then coded with information, such as micro-instruction, by permanently rendering selected transistors non-conducting during processing, while non-coded cells can be switch on when accessed by way of the address decode circuits. The coded information represented by a change or no change in the voltage level at the output circuit is used to represent the binary 1""s and 0""s. The code for the ROM is introduced during device processing by using a ROM code mask during one of the processing steps.
There are only two states in a conventional mask ROM device, the xe2x80x9cONxe2x80x9d state and the xe2x80x9cOFFxe2x80x9d state. The xe2x80x9cOFFxe2x80x9d state is typically defined by code implantation to increase the cell threshold voltage (Vth) is above 5 Volt, while the xe2x80x9cONxe2x80x9d state is defined the cell Vth to be below 1 Volt. In a high-density mask ROM (32 M or 64 M), a conventional two state mask ROM will consume a large wafer area due to the large chip size. If one memory cell can store more than three kinds of data, called a multiple states mask ROM, it is possible to greatly increase the storage capacity of a mask ROM. For example, if one memory cell can store four kinds of data, it is possible to double the storage capacity in one chip without increasing the chip area. The mask ROM is coded with its data, i.e., has its data stored in it, by using a specialized mask (representing particular required for a user) during the fabrication process.
Data stored in a mask ROM cannot be changed, rather it is only possible to read the data. A type of mask ROM causes a predetermined transistor to have a status that differs from other transistors by implanting impurity ions, so that a datum is codedxe2x80x94that is, the mask ROM causes a predetermined transistor to have an OFF state by implanting impurity ions during fabrication. Transistors for which impurity ions are not implanted during fabrication have an ON state, and vice versa; therefore, the data are coded.
A number of ROM programming techniques are known in the art. Diffusion layer programming, ion implantation, and contact programming are types of ROM manufacturing processes. Among these processes, contact programming is a technique in which a programming process is provided near the final operational steps of semiconductor device manufacturing. The contact programming system is generally a method, which can realize a short turn-around-time.
FIG. 1 illustrates a prior art Mask ROM cell configuration 20. In the example depicted in FIG. 1, a single ROM cell 22 is illustrated, which is formed from a polysilicon metal layer 26. A polysilicon metal layer 26 and single ROM cell 22 are situated below a diffusion region 32. A polysilicon metal layer 30 is situated below a diffusion region 34 and an active region 36. The example illustrated in FIG. 1 includes a total of four polysilicon metal layers 24, 26, 28, and 30. Those skilled in the art will recognize the configuration depicted in FIG. 1 as an implementation of Contact/Via programming, a well-known method for programming a ROM cell, such as the single ROM cell 22. An advantage of the Contact/Via programming technique is that it results in a short turn-around-time. A major disadvantage of this ROM programming method, however, is that it requires a large cell size.
FIG. 2 depicts a prior art diffusion-programming configuration 40. In the example depicted in FIG. 2, a series of polysilicon layers 44, 46 and 48 are situated adjacent a diffusion region 46 and 58. Two single ROM cells 52 and 54 are respectively situated above polysilicon layers 48 and 46. Those skilled in the art will recognize the configuration illustrated in FIG. 2 as depicting an implementation of diffusion programming for ROM cells. An advantage or diffusion programming is that smaller cell sizes can be utilized. However, a major disadvantage of diffusion programming is that it requires a very long turn-around-time.
FIG. 3 illustrates a prior art ion implant programming configuration 70. Those skilled in the art will recognize configuration 70 as comprising an implementation of implant programming for ROM cells. In the configuration illustrated in FIG. 3, four polysilicon layers 72, 74, 76, and 78 are shown. Implant programming offers several advantages, namely, smaller cell size and an acceptable turn-around-time. Implant programming, however, requires an extra mask, which can ultimately result in extra costs in the manufacturing process.
The present inventors have thus concluded, based on the foregoing ROM programming techniques that several key factors are desired to improve the efficiency and ultimately, the cellular and array architecture of ROM memory devices. These three desired factors include a shortened turn-around-time, a reduction in the need for utilizing an extra mask, particularly in the Via programming method, and a simple cell structure and small cell size. The invention disclosed herein addresses these needs through design and implementation
The following summary of the invention is provided to facilitate an understanding of some of the innovative features unique to the present invention, and is not intended to be a full description. A full appreciation of the various aspects of the invention can be gained by taking the entire specification, claims, drawings, and abstract as a whole.
It is therefore one aspect of the present invention provide an improved architecture for a read only memory (ROM) cell.
It is another aspect of the present invention to provide methods and system for forming ROM cell-based devices.
It is yet another aspect of the present invention to provide improved methods and systems for configuring ROM cell architectures
It is still another aspect of the present invention to provide an improved type of mask ROM.
It is an additional aspect of the present invention to provide improved contact via programming techniques for ROM devices, including programmable logic arrays thereof.
The above and other aspects of the present invention are achieved as is now described. A method and system are disclosed herein for forming a programmable logic array from a plurality of read only memory cells. A first or initial layer is generally established. The interconnection of the first metal layer with a second metal layer results in the formation of a read only memory cell there between, such that a plurality of read only memory cells can be configured to form a programmable logic array. One or more of the read only memory cells may be programmed utilizing a particular contact via programming technique, thereby resulting in a shortened turn-around-time, reducing read only memory cell size, and reducing the necessity of requiring additional masks for read only memory logical processes associated with the programmable logic array.
The programmable logic array can be configured to include a plurality of output lines connected to the first metal layer and a plurality of word lines connected to the second metal layer, such that a memory cells (i.e., mask ROM cell) can be formed through the interconnection of the first metal layer and the second metal layer. The programmable logic array can also be configured to comprise decoding circuitry for combining and decoding data obtained from a plurality of output lines connected to the first metal layer. Additionally, the interconnection of a subsequent metal layer with a previous metal layer can thereby form at least one read only memory cell there between, such that a plurality of read only memory cells can be configured to form the programmable logic array. Also, leakage detector circuitry may be connected to the programmable logic array to detect output current leakage.
The memory cells generally comprise mask ROM cells which do not require extra masks, and which can be programmed utilizing via programming techniques. The use of a top metal layer results in shortened turn-around-time. The utilization of a first metal layer and second metal layer interconnection configuration for a ROM cell results in smaller cell size and a simple and efficient cell structure. A simple decoding scheme is thereby utilized to decode data from the ROM cells and thus, the programmable logic array.
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